This article explores microchip lasers in photoresist edge repair, comparing chemical and optical EBR methods. It highlights 355nm UV lasers for precise edge bead removal, improving yield, and introduces a domestic laser solution for semiconductor lithography.

LIBS is a fast, non-destructive elemental analysis technology widely used in industry, environment and scientific research. Laser performance determines LIBS detection accuracy. Compared with traditional lasers, RealLight PQE DPSSL features compact size, high energy and short pulse, enabling high-SNR spectral acquisition and adapting to portable and commercial LIBS development.

1535 nm erbium glass lasers offer Class‑1 eye safety, 30+ km ToF ranging, –40~70°C operation without temperature control, and 150 kW peak power. RealLight provides full‑chain domestic production, 100k+ annual capacity, and customizable modules for drones, security, and lidar applications.

Microchip lasers enable portable, intelligent LIBS with high repetition rates, low power, and rugged design. RealLight's solutions overcome lab-only limits, empowering alloy sorting, environmental monitoring, and cultural heritage analysis.

Handheld LIBS enables rapid on-site light-element analysis (C, Li, etc.) with no radiation. It excels in PMI, recycling, and lithium batteries but faces cost/accuracy challenges. RealLight offers compact >5mJ, 50Hz end-pumped lasers with passive Q-switching for portable LIBS applications.

LIBS enables rapid in-situ, multi-element analysis, revolutionizing geological exploration and mineral sorting. Portable units deliver real-time results, while lab systems provide 1-2μm elemental imaging. RealLight's 10mJ PQE laser offers a compact, cost-effective LIBS source.